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Atomistic simulations of surface coverage effects in anisotropic wet chemical etching of crystalline silicon

Referentgranskad
Gosálvez, Miguel; Foster, Adam; Nieminen, Risto
-2002

An atomistic introduction to anisotropic etching

Referentgranskad
DOI
10.1088/0960-1317/17/4/S01
Gosálvez, M.A.; Sato, Kazuo; Foster, A S; Nieminen, R M; Tanaka, H.
Journal of Micromechanics and Microengineering2007

Wet Etching of Silicon

Referentgranskad
DOI
10.1016/B978-0-323-29965-7.00022-1
Gosálvez, Miguel A.; Zubel, I.; Viinikka, Eeva
Elsevier2015

Tungsten: Sputter deposition and plasma etching

Referentgranskad
DOI
10.1016/0169-4332(91)90286-S
Franssila, Sami
Applied Surface Science1991

Deep Silicon Structures by Electrochemical Etching

Grigoras, Kestutis; Niskanen, A.J.; Franssila, Sami
-2000

Pattern shape effects and artefacts in deep silicon etching

Referentgranskad
DOI
10.1116/1.581761
Kiihamäki, J.; Franssila, Sami
Journal of Vacuum Science and Technology A1999

Deep plasme etching of glass for fluidic devices

Kolari, K.; Saarela, V.; Franssila, S.
-2007

Loading effects in deep silicon etching

Referentgranskad
Karttunen, J.; Kiihamäki, J.; Franssila, S.
-2000

Dry Etching Process Development for Submicron and Nanometer Semiconductor

Stepanov, V.
-1993

The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching

Referentgranskad
Chekurov, Nikolai; Grigoras, Kestutis; Peltonen, Antti; Franssila, Sami; Tittonen, Ilkka
Nanotechnology2009

Atomistic simulations of surface coverage effects in anisotropic wet chemical etching of crystalline silicon

Referentgranskad
2002

An atomistic introduction to anisotropic etching

Referentgranskad
DOI
10.1088/0960-1317/17/4/S01
2007

Wet Etching of Silicon

Referentgranskad
DOI
10.1016/B978-0-323-29965-7.00022-1
2015

Tungsten: Sputter deposition and plasma etching

Referentgranskad
DOI
10.1016/0169-4332(91)90286-S
1991

Deep Silicon Structures by Electrochemical Etching

2000

Pattern shape effects and artefacts in deep silicon etching

Referentgranskad
DOI
10.1116/1.581761
1999

Deep plasme etching of glass for fluidic devices

2007

Loading effects in deep silicon etching

Referentgranskad
2000

Dry Etching Process Development for Submicron and Nanometer Semiconductor

1993

The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching

Referentgranskad
2009