University lecturer, Helsingfors universitet

Nyckelord

ALD, atomic layer deposition, batteries, chemistry, thin films

Affiliering

Aalto University
Enheten
Department of Chemistry and Materials Science
Källa: ORCID
Title
University teacher 2018 - 2019

Helsingfors universitet
Enheten
Department of Chemistry
Källa: ORCID
Title
University lecturer 2020 -

University of Helsinki
Enheten
Department of Chemistry
Källa: ORCID
Title
Doctoral student 2010 - 2017

Picosun (Finland)
Källa: ORCID
Title
Process engineer 2017 - 2018

Utbildning

Grader
Master of Science 2008 - 2010 / University of Helsinki
Doctor of Philosophy 2010 - 2017 / University of Helsinki
Bachelor of Science 2005 - 2008 / University of Helsinki

Publikationer (19)

Atomic layer deposition of CoF2, NiF2 and HoF3 thin films
2023

Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air
2023

Electrochemical reduction of carbon dioxide to formate in a flow cell on CuSx grown by atomic layer deposition
2023

Aktiviteter och priser (1)

Board membermedlemskap2020