undefined

Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air

Publiceringsår

2023

Upphovspersoner

Yim, Jihong; Haimi, Eero; Mäntymäki, Miia; Kärkäs, Ville; Bes, René; Gutierrez, Aitor Arandia; Meinander, Kristoffer; Brüner, Philipp; Grehl, Thomas; Gell, Lars; Viinikainen, Tiia; Honkala, Karoliina; Huotari, Simo; Karinen, Reetta; Putkonen, Matti; Puurunen, Riikka L.
Visa mer

Abstrakt

The self-terminating chemistry of atomic layer deposition (ALD) ideally enables the growth of homogeneously distributed materials on the atomic scale. This study investigates the ALD of zinc oxide (ZnO) on mesoporous zirconium oxide (ZrO2) using zinc acetylacetonate [Zn(acac)2] and synthetic air in a fixed-bed powder ALD reactor. A broad variety of methods, including thermogravimetry analysis, scanning electron microscopy with energy-dispersive X-ray spectroscopy, low-energy ion scattering, X-ray absorption near-edge structure, X-ray photoelectron spectroscopy, in-situ diffuse reflectance infrared Fourier transform spectroscopy–mass spectrometry, and density functional theory calculations, were used to analyze the reactant and the resulting samples. The factors affecting the zinc loading (wt %) on ZrO2 were investigated by varying the ALD reaction temperature (160–240 °C), the calcination temperature of zirconium oxide (400–1000 °C), and the ALD cycle number (up to three). The studied process showed self-terminating behavior with the areal number density of zinc of approximately two atoms per square nanometer per cycle. Zinc was distributed throughout ZrO2. After the Zn(acac)2 reaction, acac ligands were removed using synthetic air at 500 °C. In the following cycles, already-deposited ZnO acted as nuclei for further ZnO growth. This study demonstrates the potential of Zn(acac)2 as an ALD reactant and provides an initial understanding of ZnO growth via ALD on high surface area porous particles as an example for catalytic applications.
Visa mer

Organisationer och upphovspersoner

Jyväskylä universitet

Honkala Karoliina

Gell Lars

Aalto-universitetet

Arandia Gutierrez Aitor Orcid -palvelun logo

Haimi Eero

Yim Jihong Orcid -palvelun logo

Meinander Kristoffer

Karinen Reetta Orcid -palvelun logo

Puurunen Riikka Orcid -palvelun logo

Viinikainen Tiia Orcid -palvelun logo

Kärkäs Ville

Helsingfors universitet

Putkonen Matti

Mäntymäki Miia

Bes René

Huotari Simo

Publikationstyp

Publikationsform

Artikel

Moderpublikationens typ

Tidning

Artikelstyp

En originalartikel

Målgrupp

Vetenskaplig

Kollegialt utvärderad

Kollegialt utvärderad

UKM:s publikationstyp

A1 Originalartikel i en vetenskaplig tidskrift

Publikationskanalens uppgifter

Moderpublikationens namn

Chemistry of Materials

Volym

35

Nummer

19

Sidor

7915-7930

Publikationsforum

53342

Publikationsforumsnivå

3

Öppen tillgång

Öppen tillgänglighet i förläggarens tjänst

Ja

Öppen tillgång till publikationskanalen

Delvis öppen publikationskanal

Parallellsparad

Ja

Övriga uppgifter

Vetenskapsområden

Fysik; Kemi; Teknisk kemi, kemisk processteknik; Materialteknik

Nyckelord

[object Object],[object Object],[object Object],[object Object],[object Object]

Publiceringsland

Förenta staterna (USA)

Förlagets internationalitet

Internationell

Språk

engelska

Internationell sampublikation

Ja

Sampublikation med ett företag

Ja

DOI

10.1021/acs.chemmater.3c00668

Publikationen ingår i undervisnings- och kulturministeriets datainsamling

Ja