Zero Birefringence and Zero Birefringence Dispersion in 3 µm-thick Silicon-on-Insulator Waveguides
Publiceringsår
2024
Upphovspersoner
Bryant, Katherine; Hokkanen, Ari; Shahwar, Dura; Harjanne, Mikko; Salmi, Antti; Aalto, Timo
Abstrakt
In this study, effective index birefringence and group index birefringence are investigated for 3 µm-thick silicon-on-insulator (SOI) strip waveguides, and experimental results are compared with simulations. We confirm zero group index birefringence at 1550 nm for a waveguide width of 2.6 µm; the absolute value of the same waveguide's group index birefringence is less than 2×10-4 over the measured 150 nm wavelength range. We further verify zero effective index birefringence at 1550 nm for a waveguide width of 3.2 µm, and the absolute value of its effective index birefringence is less than 6×10-5 over the same 150 nm wavelength range. Group and effective index birefringence dispersion are calculated based on the birefringence wavelength dependence, and the waveguide width needed to attain zero dispersion for either group or effective index birefringence is identified, at 3.1 µm and 2.7 µm, respectively. As a complement to our experimental findings, COMSOL simulations are conducted to analyze both the geometric- and stress-induced birefringence effects within the waveguides. The simulated birefringence values closely align with our experimental data, thereby validating the experimental results. We thus demonstrate the feasibility of achieving zero birefringence and zero birefringence dispersion through tuning the waveguide width in 3 µm SOI strip waveguides and validate these results via the agreement of a range of measurement methods and simulation.
Visa merOrganisationer och upphovspersoner
Aalto-universitetet
Shahwar Dura
Publikationstyp
Publikationsform
Artikel
Moderpublikationens typ
Tidning
Artikelstyp
En originalartikel
Målgrupp
VetenskapligKollegialt utvärderad
Kollegialt utvärderadUKM:s publikationstyp
A1 Originalartikel i en vetenskaplig tidskriftPublikationskanalens uppgifter
Journal
Förläggare
Volym
43
Nummer
2
Sidor
747-756
ISSN
Publikationsforum
Publikationsforumsnivå
3
Öppen tillgång
Öppen tillgänglighet i förläggarens tjänst
Ja
Öppen tillgång till publikationskanalen
Delvis öppen publikationskanal
Parallellsparad
Ja
Publiceringsavgift för öppen tillgång €
707
Övriga uppgifter
Vetenskapsområden
Fysik; El-, automations- och telekommunikationsteknik, elektronik
Nyckelord
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Förlagets internationalitet
Internationell
Språk
engelska
Internationell sampublikation
Nej
Sampublikation med ett företag
Nej
DOI
10.1109/JLT.2024.3467707
Publikationen ingår i undervisnings- och kulturministeriets datainsamling
Ja