Photo-Atomic Layer Printing
Bidragets beskrivning
Chip manufacturing is resource-intensive relying on critical raw materials (CRMs). Methods are rigid to change and sensitive to issues in supply chains. Essential thin-film patterning by photolithography makes lots of toxic waste. Needed better chip performance adds environmental risks in manufacturing. Objectives: Proof of concept, photolithography-free-thin-film deposition equipment for chip manufacturing with Photo-assisted Atomic Layer Deposition. New process chemistries enabling direct pattern printing. Validated technology via novel neuromorphic chips in sensors and memristors. Communicate, disseminate, and scale up the developed solutions. PhotoPrint will enable novel chip designs, like neuromorphics, and circuitry on various products. Beyond the project, PhotoPrint will revolutionize chip manufacturing with reduced environmental footprint. PhotoPrint will be accessible to a broad audience, facilitating inclusiveness and microelectronics for a sustainable and responsible society
Visa merStartår
2025
Slutår
2028
Beviljade finansiering
Finansiär
Finlands Akademi
Typ av finansiering
Internationell utlysning
Beslutfattare
Suomen akatemian muu päättäjä
03.04.2025
03.04.2025
Övriga uppgifter
Finansieringsbeslutets nummer
372234
Vetenskapsområden
Kemi
Forskningsområden
Epäorgaaninen kemia
Identifierade teman
nuclear safety, nuclear reactors