Photo-Atomic Layer Printing

Bidragets beskrivning

Chip manufacturing is resource-intensive relying on critical raw materials (CRMs). Methods are rigid to change and sensitive to issues in supply chains. Essential thin-film patterning by photolithography makes lots of toxic waste. Needed better chip performance adds environmental risks in manufacturing. Objectives: Proof of concept, photolithography-free-thin-film deposition equipment for chip manufacturing with Photo-assisted Atomic Layer Deposition. New process chemistries enabling direct pattern printing. Validated technology via novel neuromorphic chips in sensors and memristors. Communicate, disseminate, and scale up the developed solutions. PhotoPrint will enable novel chip designs, like neuromorphics, and circuitry on various products. Beyond the project, PhotoPrint will revolutionize chip manufacturing with reduced environmental footprint. PhotoPrint will be accessible to a broad audience, facilitating inclusiveness and microelectronics for a sustainable and responsible society
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Startår

2025

Slutår

2028

Beviljade finansiering

Ville Miikkulainen Orcid -palvelun logo
299 737 €

Finansiär

Finlands Akademi

Typ av finansiering

Internationell utlysning

Beslutfattare

Suomen akatemian muu päättäjä
03.04.2025

Övriga uppgifter

Finansieringsbeslutets nummer

372234

Vetenskapsområden

Kemi

Forskningsområden

Epäorgaaninen kemia

Identifierade teman

nuclear safety, nuclear reactors