In this project, we develop ultrahigh-resolution modification of materials with laser radiation. In nanotechnology, laser-fabrication is used for example in modification of two-dimensional, one atom thick materials. Laser writing can be used to fabricate circuits and devices in micrometer scale. This scale is too large for many applications especially in modern electronics, where components can be fabricated with the accuracy of 10 nm. In this project, we aim to bridge this gap by utilizing optical near-field techniques, that will yield 10 nm spatial resolution in laser writing. This achievement will revolutionarize the potential of laser writing in many applications. The applicability of the developed techniques will be demonstrated by area-selective atomic layer deposition in 10 nm scale, which will be an important technique in the development of electronics.

2023

2027