ALDI

Atomic layer deposition (ALD) is at the heart of global nanotechnology innovation. The ALDI Consortium will investigate reactive transport in ALD in porous media via computational fluid dynamics (CFD) simulations, at different levels of detail and flow regimes (continuum, molecular flow), and experimentally. The evolution of conformality of ALD processes will be described on nanostructured rectangular gaps and fixed beds of porous particles. Concurrent saturation profile measurements will be made, to experimentally assess the kinetic growth parameters. ALDI aims, through interdisciplinary combination of molecular/fluid physics combination with chemical reaction engineering, to produce valuable kinetic benchmark data and to fundamentally impact the way conformality is analysed in the field of ALD. New open data(base) and open source modelling/simulation tools are planned.

2020

2024